Professor Snyder's Ph.D. research involved using pulsed lasers to study impurity-related luminescence in III-V semiconductors, at cryogenic
temperatures. A post-doctoral position at the University of Nebraska-Lincoln followed, where he used ellipsometry as a tool to study the properties of metals, semiconductors, and dielectrics. As Assistant and then Associate Professor his involvement in the development and use of ellipsometry continued. This included analysis techniques applied to
semiconductor multilayer structures, and real-time monitoring and control during various processes such as patterned etching.
P.G. Snyder, J.E. Oh, J.A. Woollam and R.E. Owens, "Ellipsometric analysis of built-in electric fields in semiconductor heterostructures," Appl. Phys. Lett. 51, 770-772 (1987).
P.G. Snyder, J.A. Woollam, S.A. Alterovitz, and B. Johs, "Modeling AlGaAs optical constants, as functions of composition," J. Appl. Phys. 68, 5925-5926 (1990).
H.D. Yao and P.G. Snyder, "In-situ ellipsometric studies of optical and surface properties of GaAs (100) at elevated temperatures," Thin Solid Films 206, 283-287 (1991).
P.G. Snyder, Y.-M. Xiong, J.A. Woollam, E.R. Krosche, and Y. Strausser, "Characterization of polycrystalline silicon thin film multilayers by variable angle spectroscopic ellipsometry," Surface and Interface Analysis 18, 113-118 (1992).
Y.-M. Xiong, P.G. Snyder, and J.A. Woollam, "Photoellipsometric determination of surface Fermi level in (100) GaAs," J. Vac. Sci. Technol. A11, 1075-1082 (1993).
S. Nafis, N.J. Ianno, P.G. Snyder, W.A. McGahan, B. Johs, and J.A. Woollam, "Electron cyclotron resonance etching of semiconductor structures studied by in-situ spectroscopic ellipsometry," Thin Solid Films 233, 253-255 (1993). Also presented at 1st International Conference on Spectroscopic Ellipsometry (ICSE-1), Paris, 1993.
C.M. Herzinger, P.G. Snyder, B. Johs, and J.A. Woollam, "InP optical constants from 0.75 to 5.0 eV determined by variable angle spectroscopic ellipsometry," J. Appl. Phys. 77, 1715-1724 (1995).
C.M. Herzinger, H. Yao, P.G. Snyder, F.G. Celii, Y.-C. Kao, D. Chow, B. Johs, and J.A. Woollam, "Studies of thin strained InAs, AlAs, and AlSb layers by spectroscopic ellipsometry," J. Appl. Phys. 79, 2663-2674 (1996).
P.G. Snyder, T.E. Tiwald, D.W. Thompson, N.J. Ianno, J.A. Woollam, M.G. Mauk and Z.A. Shellenbarger, "Infrared free carrier response of In0.15Ga0.85As0.17Sb0.83 epilayers on GaSb," Thin Solid Films 313-314, 667-670 (1998). Also presented at 2nd International Conference on Spectroscopic Ellipsometry (ICSE-2), Ch02/24/2006 P.G. Snyder, "Real time monitoring and control of wet etching of GaAs/ AlGaAs using real time spectroscopic ellipsometry," J. Vac. Sci. Technol. B17, 2045-2049 (1999).
S.-J. Cho, P.G. Snyder, C.M. Herzinger, B. Johs, "Etch depth control in bulk GaAs using patterning and real time spectroscopic ellipsometry," J. Vac. Sci. Technol. B20, 197-202 (2002).
• Mustafa "Cenk" Gursoy, assistant professor of electrical engineering, received "The 2004-2007 Journal of Wireless Communications and Networking Best Paper Award" from the European Association for Signal Processing (EURASIP), founded in 1978. The award will be presented during the 17th EUSIPCO Conference: August 24-28, 2009 in Glasgow, Scotland. Gursoy co-wrote the award-winning paper, "On-Off Frequency-Shift Keying for Wideband Fading Channels," published in 2006, with H. Vincent Poor and Sergio Verdœ.
• P. Frazer Williams, UNL's Lott Distinguished Professor Emeritus with the Department of Electrical Engineering, is one of 360 journal reviewers receiving the American Physical Society's Outstanding Referee designation, a lifetime honor, in 2009. The APS has 47,000 physicist members worldwide.
• Dr. Paul Snyder, Associate Professor in the Electrical Engineering Department, recently received a Recognition Award from the UNL Teaching Council and UNL Parents Association. This is the second recognition award Snyder has received.
Department of Electrical Engineering
University of Nebraska-Lincoln
209N Walter Scott Engineering Center
P.O. Box 880511
Lincoln, NE 68588-0511, USA
Phone: +1-402-472-3771
Fax: +1-402-472-4732