After receiving the Ph.D. degree from the University of Minnesota, Dr. Soukup went to work at Sperry Rand Univac (now Unisys) where he worked for three years on thin film hybrid microelectronic circuits and thin film devices. He then began his academic career at the University of Iowa as an Assistant Professor. He came to the University of Nebraska in 1976 as an Associate Professor. He became Department Chairman in 1978, a position he held until June 30, 2000, and was promoted to Professor in 1980. He is currently Henson Professor of Electrical Engineering, an honor he received on July 1, 1998. He is a past President of the National Electrical Engineering Department Heads Association (NEEDHA) and of the Central States Electrical Engineering Department Heads Association (CSEEDHA), past Chairman of the IEEE Education Society Millman Awards Committee and of the ASEE Terman Awards Committees. He was also an Accrediting Board for Engineering and Technology (ABET) reviewer. He was elected Fellow of the IEEE in 1993. In 1998 he won the NEEDHA Outstanding Service Award and, in 2000, the CSEEDHA Outstanding Service Award. He was elected Treasurer of the IEEE Education Society in 1998 and re-elected in 1999, 2000, 2001, 2002, and 2003. In 2005 he received the prestigious IEEE Education Society Meritorious Service Award. In 2006 Dr. Soukup was again elected to the Administrative Committee of the IEEE Education Society.
The major thrust of research is in thin film semiconductors for solar cells and other wide bandgap semiconductor materials. In addition, the material BaSrTiO3 is being explored for tunable antenna applications. Much of the research uses the hollow cathode deposition technique.
R. J. Soukup and K. J. Kantor, "Hydrogenated Amorphous Silicon Thin Films Deposited by Triode Assisted Reactive Sputtering," J. Vac. Sci. Technol. A10, 1728-1733 (1992).
L. Soukup, V. PeÍina, L. Jastrabík, M. Šícha, P. Pokorný, R. J. Soukup, M. Novák, and J. Zemek, "Germanium Nitride Layers Prepared by Supersonic RF Plasma Jet," Surface and Coatings Technol. 78, 280-283 (1996).
D. R. Konz and R. J. Soukup, "Quality Hydrogenated Amorphous Silicon Deposited by Triode Reactive Sputtering," Solar Energy Materials and Solar Cells 56, 175-182 (1999).
G. Pribil, Z. Hubiĉka, R. J. Soukup, and N. J. Ianno, "Deposition of Electronic Quality Amorphous Silicon, a-Si:H, Thin Films by a Hollow Cathode Plasma-Jet Reactive Sputtering System," J. Vac. Sci. Technol. A19, 1571-1576 (2001).
Z. Hubiĉka, G. Pribil, R. J. Soukup, and N. J. Ianno, "Investigations of the RF and DC Hollow Cathode Plasma-Jet Sputtering Systems for the Deposition of Amorphous Silicon Thin Films," Surface and Coatings Technol. 160, 114-123 (2002).
R. J. Soukup, N. J. Ianno, G. Pribil and Z. Hubiĉka, "Deposition of High Quality Silicon, Germanium and Silicon-Germanium Thin Films by a Hollow Cathode Reactive Sputtering System," Surface and Coatings Technol. 177-178, 676-681 (2004).
R. J. Soukup, N. J. Ianno, S. A. Darveau, and C. L. Exstrom, "Thin Films of a-SiGe:H with Device Quality Properties Prepared by a Novel Hollow Cathode Deposition Technique," Solar Energy Materials and Solar Cells 87, 87-98 (2005).
J. S. Schrader. J. L. Huguenin-Love, R. J. Soukup, N. J. Ianno, C. L. Exstrom, S. A. Darveau, R. N. Udey, and V. L. Dalal, "Thin Films of GeC Deposited Using a Unique Hollow Cathode Sputtering Technique," Solar Energy Materials and Solar Cells 90, 2338-2345 (2006).
J. L. Huguenin-Love, R. J. Soukup, N. J. Ianno, J. S. Schrader, D. W. Thompson, and V. L. Dalal, "Optical and Crystallographic Analysis of Thin Films of GeC Deposited Using a Unique Hollow Cathode Sputtering Technique," Materials Science and Semiconductor Processing 9, 759-763 (2006).
R. J. Soukup, N. J. Ianno, and J. L. Huguenin-Love, "Analysis of Semiconductor Thin Films Deposited using a Hollow Cathode Plasma Torch," to be published in Solar Energy Materials and Solar Cells.
Rodney J. Soukup, Natale Ianno, Scott Darveau, and Christopher L. Exstrom, "Optical and Electronic Characterization of a-SiGe:H Thin Films Prepared by a Novel Hollow Cathode Deposition Technique," Mat. Res. Soc. Symp. Proc. 808 (2004), pp. A9.4.1-A9.4.6.
N. J. Ianno, R. J. Soukup, Z. Hubiĉka, J. Olejní ek, and H. Šíchová, "RF Hollow Cathode Plasma Jet Deposition of BaxSr1-xTiO3 Films," Mat. Res. Soc. Symp. Proc. 869 (2005), pp. D2.4.2-D2.4.6.
• Mustafa "Cenk" Gursoy, assistant professor of electrical engineering, received "The 2004-2007 Journal of Wireless Communications and Networking Best Paper Award" from the European Association for Signal Processing (EURASIP), founded in 1978. The award will be presented during the 17th EUSIPCO Conference: August 24-28, 2009 in Glasgow, Scotland. Gursoy co-wrote the award-winning paper, "On-Off Frequency-Shift Keying for Wideband Fading Channels," published in 2006, with H. Vincent Poor and Sergio Verdœ.
• P. Frazer Williams, UNL's Lott Distinguished Professor Emeritus with the Department of Electrical Engineering, is one of 360 journal reviewers receiving the American Physical Society's Outstanding Referee designation, a lifetime honor, in 2009. The APS has 47,000 physicist members worldwide.
• Dr. Paul Snyder, Associate Professor in the Electrical Engineering Department, recently received a Recognition Award from the UNL Teaching Council and UNL Parents Association. This is the second recognition award Snyder has received.
Department of Electrical Engineering
University of Nebraska-Lincoln
209N Walter Scott Engineering Center
P.O. Box 880511
Lincoln, NE 68588-0511, USA
Phone: +1-402-472-3771
Fax: +1-402-472-4732
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