Course Objectives

For ELEC 420/820
Plasma Processing of Semiconductors

For the students to:

• understand and be able to apply basic ideas of charged particle transport in low pressure plasmas.
  
• understand and be able to apply basic ideas of atomic and molecular collisions in low pressure plasmas.
  
• understand and able to apply basic ideas of chemical reactions and kinetics as they apply to low pressure plasmas.
  
• understand the basic phenomena in low pressure D.C. and R.F. plasmas.
  
• learn the characteristics of the common processing discharge types: capacitive, inductive, and wave-heated.
  
• learn the basic processing issues behind etching of silicon.