Professor Lu becomes JLA's new Editor-in-Chief
2018
Congratulations to Professor Lu on his new position as the Editor-in-Chief of the Journal of Laser Applications.
Journal of Laser Applications (JLA), co-published by the Laser Institute of America (LIA) and AIP Publishing, is proud to announce its new Editor-in-Chief, Professor Yongfeng Lu. He is no stranger to the Journal, having served as Senior Editor in the category, “Lasers in Nanomanufacturing/Nanophotonics & Thin Film Technology,” for 7 years. In 2014, Lu served as President of LIA, and in 2016, was awarded the prestigious Arthur L. Schawlow Prize in Laser Science.
Professor Lu received his degree in Electrical Engineering in 1984 from the Tsinghua University in Beijing, China and his Ph.D. from Osaka University, Japan in 1991. After earning his degrees, Lu spent 11 years as a lecturer and professor at the National University of Singapore. Lu is a leading researcher in laser-based micro- and nano-scale materials processing, characterization, and imaging. He has developed numerous laser-based material processing technologies and implemented them for use in commercial applications.
Professor Lu is currently the Lott University Professor in the Department of Electrical Engineering at the University of Nebraska-Lincoln. Upon joining the faculty in 2002, Lu established the Laser Assisted Nano Engineering group, and has led several research projects funded by NSF, AFOSR, ONR, DTRA, DOE, DOT, NCESR, NRI, private companies, and other foundations located in Japan.
We would like to thank Professor Dr. Reinhart Proprawe for his leadership and guidance as the Editor-in-Chief of JLA since 2010. As LIA celebrates its 50th Anniversary in 2018, we look forward to the direction of Professor Lu as the new Editor-in-Chief of JLA.